ULVAC - RHL-PS/PSS
Manufactured by ULVAC
Flat-Type Infared Furnace
Usable in a wide range of fields from carbon nanotube growth systems to production systems. Flat reflection type infrared furnaces can be used in wafer annealing systems from Φ 2-inches to Φ 300 mm and production baking furnaces.
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Features of RHL-PS/PSS
Applications
Heating large glass substrates (solar cells, flat display panels, etc.) * High-temperature, high-speed heating of semiconductor wafers
Features * The Ps type has a 40 mm wide reflector, the Pss type has a 20 mm wide reflector, which allows high density lamp placements. * Both the Ps type and Pss type can heat wide areas by increasing the number of reflectors.
General Specifications
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